Conductive SU8 Photoresist for Microfabrication

A conductive composite photoresist has been developed for the direct photopatterning of electrodesA conductive composite photoresist has been developed for the direct photopatterning of electrodes. It is based on a dispersion of silver nanoparticles in SU8, a non-conductive, negative-tone photoresist. Manufactured structures have an electrical conduc- tivity at a low silver content of around 6 vol.-%.

Evolution of the electrical resistivity of the SU8-silver composite versus silver volume fraction, before and after thermal treatment (iso- therm of 90 min at 120 􏰟C). A drastic switch in resistivity was observed at the percolation threshold (6 vol.-%), and an electrical conductivity en- hancement was obtained after the thermal treatment.

Jiguet, Sébastien ; Bertsch, Arnaud ; Hofmann, Heinrich ; Renaud, Philippe

Advanced Functional Materials, num. 15, 2005, p. 1511-1516

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