Gersteltec SU8 is well suited for LIGA processing. its excellent sensitivity and achievable vertical side wall profile for high precision fabrication of micro compoments by X-ray and UV light. Photoresist resist products are available in 250ml, 500ml, 1 Liter, 4 Liter bottles, in addition we can package into 10 and 20 Liter Nowpaks.
At Gersteltec, the smallest particles have a big effect: Gersteltec uses nano-objects to develop and produce innovative high-technology additives that give completely new combinations of properties to a wide range of epoxy substances. The results are materials with superior characteristics that give our clients a decisive lead over the competition.
Nanomaterials have unique properties which enables their utilization in functionl coating snd printing. Gersteltec research is. focused on developing Ready-to-use resist formulations of nanomaterials in a variety of viscosities and utilization of. these materials as “ink” and “paint” for customers requirements to reduced material waste. Providing ink polymers solution for drop-on-demand and micro-dispensing devices. Gersteltec developed an inkjettable low-stress dielectric with low residual stress.