Gersteltec develops, manufacture and designed resist for electron beam lithography to answer the demands of the EBL community. Gersteltec offers several kinds of e-Beam and p-Beam resist under different products forms that can give your company an extra competitive edge. As Negative resin GM10xx, GLM10xx and SML resist and positive PMMA resist.
Gersteltec offers ready-to-use formulated products with different types of filler, pigments, ink and solvent (ceton, ether acetate, aromathic and more) according to your needs. Gersteltec photoepoxy materials and products meet and exceed the needs of the world´s leading microsystem device makers with advanced functional SU-8 photoresist.