SU-8 photoresist is commonly used in the field of microfabrication as structural material or for molding of microfluidic devices. One major limitation, however, is the difficulty to process partially freestanding SU-8 structures or monolithic closed cavities and channels on-chip Fabrication process of a suspended SU-8 structure for a monolithic closed SU-8 microchannel. a A standard SU-8 layer...Continue Reading

We report a process for the realization of polyimide films with custom-designed microporosity based on the heat-induced depolymerization of polyimide-embedded polypropylene carbonate microstructures. SEM cross-section views of fabricated arrays of microcavities in a PI layer: (a) 30 μm wide voids; (b) 80 μm wide voids; (c) PI layer stack encompassing two levels of cavities; (d) a zoom...Continue Reading