Press release: 2010 :Gersteltec & Valsynthese


EPFL - Center of MicroNanoTechnology

ISO: 9001: 2008

Welcome to Gersteltec site
Gersteltec functional SU-8 offer tailored-to-application solutions  for a wide range of industrial applications. Nano photoresist SU-8 exhibits excellent results suitable for advanced micro technologies. The opportunity to use conventional UV lithography for the patterning of ultrathick SU-8 Functional Photoresist layers enables a wide range of applications:
  • Flexible Display
  • E-paper
  • Microfluidic
  • LIGA
  • Semiconductor
  • Transportation
  • Packaging, CSP, WLP, SLC, HD
  • Watch movements and components
  • Solar Energy
  • Nanoimprint lithography
  • Micro fuel cell systems
  • InkJet ,spray
  • Photonic crystal
  • Biomedical

Japan at the "Swiss Pavilion"     japanese         german

BioMEMS-Tailor made SU8  Functional SU8 GMPI- Antimony Free