EPFL - Center of MicroNanoTechnology
NAMASEN EP7-Advanced Training at Gersteltec for Neurosciences and Neuroengineering
The Nano photoresist SU-8 exhibits excellent results suitable for advanced micro technologies.The opportunity to use conventional UV lithography for the patterning of ultrathick SU-8 Functional Photoresist layers enables a wide range of applications:
- Biomedical
- Display, flexible Display
- Microfluidic
- Semiconductor
- Transportation
- Packaging, CSP, WLP, SLC, HD
- Watch movements and components
- Solar Energy
- Nanoimprint lithography
- Micro fuel cell systems
- InkJet ,spray
- Photonic crystal
Japan at the "Swiss Pavilion" japanese ![]()
Gersteltec Engineering Solutions 